MPA Industrie proposes study and realization of CVD reactors aimed to Chemical Vapour Deposition for coatings or infiltration realization
These reactors operate from vacuum until atmospheric pressure, in a range of temperatures from 500 to 2200°C. The diameter of these reactors is included between 100 mm and 3000 mm of useful zone.
MPA industrie has also already designed fluidized bed from 1,5 inch to 7 inch for pyrocarbon Sic application.
Most of the case for CVD applications operate under vacuum from 10-2 mbar to several hundreds mbar. This technique yields better quality layers ( density, homogeneity…) and low gas consumption.
Classical CVD operates under temperature activation of the gas phase. In order to lower the deposition temperature it is possible to activate the gas phase through electron activation obtained with plasma. Several techniques for plasma activation are possible.
Chemical vapour infiltration is the wellknown technique to elaborate ceramic matrix composite such as carbon/carbon or Silicon carbide/carbon composites.
Each time a woven substrate ( carbon fibers) or carbon foam is infiltrated with ceramics material.