Metal chlorination

This method is used to generate in situ metal vapour. Generally the chemical attack by HCl or HF at high temperature is very efficient and supply with a good accuracy the precursor.
This system is adapted for aluminium ( AlCl3 generator) , Zirconium ( ZrCl4 generator).

Aluminium

Medium temperature chlorinator for AlCl3 vapour supply

Zirconium, Hafnium

High temperature chlorinator for HfCl4 vapour supply