MPA Industrie

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Metal chlorination

This method is used to generate in situ metal vapour. Generally the chemical attack by HCl or HF at high temperature is very efficient and supply with a good accuracy the precursor.
This system is adapted for aluminium ( AlCl3 generator) , Zirconium ( ZrCl4 generator).

Aluminium

AluminiumMedium temperature chlorinator for AlCl3 vapour supply
 

Zirconium, Hafnium

ZirconiumHigh temperature chlorinator for HfCl4 vapour supply