MPA Industrie

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Vacuum technique

The chemical vapour deposition process is very severe for pump components. It is the reason for what, MPA Industrie has developed relevant technique to pump effluent from CVD process. One consists of modifying liquid ring pump system to be adapted to the CVD. Generally this system is coupled with a scrubber station.
The over technique is based on dry pump mainly adapted for chemical process.
In case of clean vacuum, classic rotary pump coupled with roots pumps is used and if low vacuum is required diffusion pump or turbo molecular pump can be added.

Dry vacuum

Dry vacuum Motor speed controlled dry pump for CVD process
 

Liquid ring pump

Liquid ring pump Motor speed controlled liquid ring pump combined with scrubber station for CVD process