MPA Industrie proposes design and build of CVD reactors aimed to Chemical Vapor Deposition for coatings, infiltration, graphite purification, and fluoride Ion cleaning process.

These reactors operate from vacuum until atmospheric pressure, in a wide range of temperatures from 500 to 2300°C. The diameter of these reactors is included between 100 mm and 3000 mm for the useful zone.

Most of the case for CVD applications operates under vacuum from 10-2 mbar to several hundred mbar.

SiC/BN/PYC CVI system

SiC/BN/PYC CVI system

SiC/BN/PYC CVI system
Twin station FIC furnace

Twin station FIC furnace

Twin station FIC furnace
Twin station SiC CVD coating system + purification unit

Twin station SiC CVD coating system + purification unit

Twin station SiC CVD coating system + purification unit
Ultra large CVI system

Ultra large CVI system

Ultra large CVI system
Bulk ZnS CVD system

Bulk ZnS CVD system

Bulk ZnS CVD system
Large vacuum chamber for JVD process

Large vacuum chamber for JVD process

Large vacuum chamber for JVD process
SiC CVD coating system for MOCD carrier

SiC CVD coating system for MOCD carrier

SiC CVD coating system for MOCD carrier
TiC/TiN/TiCN/Al203 CVD system

TiC/TiN/TiCN/Al203 CVD system

TiC/TiN/TiCN/Al203 CVD system
Nano powder production unit

Nano powder production unit

Nano powder production unit
SIC/PYC Fluidized bed reactor for nuclear application

SIC/PYC Fluidized bed reactor for nuclear application

SIC/PYC Fluidized bed reactor for nuclear application
SiC/BN/PYC CVI system

SiC/BN/PYC CVI system

SiC/BN/PYC CVI system
Laboratory CVD system for SiC/PYC/ZrC/HfC/TaC

Laboratory CVD system for SiC/PYC/ZrC/HfC/TaC

Laboratory CVD system for SiC/PYC/ZrC/HfC/TaC
Boron 10 CVD reactor

Boron 10 CVD reactor

Boron 10 CVD reactor
Aligned carbon nanotubes CVD system

Aligned carbon nanotubes CVD system

Aligned carbon nanotubes CVD system